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Search for "plasma-enhanced chemical vapor deposition (PE-CVD)" in Full Text gives 3 result(s) in Beilstein Journal of Nanotechnology.

One-step synthesis of carbon-supported electrocatalysts

  • Sebastian Tigges,
  • Nicolas Wöhrl,
  • Ivan Radev,
  • Ulrich Hagemann,
  • Markus Heidelmann,
  • Thai Binh Nguyen,
  • Stanislav Gorelkov,
  • Stephan Schulz and
  • Axel Lorke

Beilstein J. Nanotechnol. 2020, 11, 1419–1431, doi:10.3762/bjnano.11.126

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  • Abstract Cost-efficiency, durability, and reliability of catalysts, as well as their operational lifetime, are the main challenges in chemical energy conversion. Here, we present a novel, one-step approach for the synthesis of Pt/C hybrid material by plasma-enhanced chemical vapor deposition (PE-CVD). The
  • acetylacetonate precursors. Keywords: electrocatalyst; fuel cells; hybrid nanomaterial; long-term stability; nanoparticle embedding; one-step synthesis; plasma-enhanced chemical vapor deposition (PE-CVD); Introduction The global fuel cell market reached a value of $4.5 billion USD in 2018 and is projected to
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Published 17 Sep 2020

High photocatalytic activity of Fe2O3/TiO2 nanocomposites prepared by photodeposition for degradation of 2,4-dichlorophenoxyacetic acid

  • Shu Chin Lee,
  • Hendrik O. Lintang and
  • Leny Yuliati

Beilstein J. Nanotechnol. 2017, 8, 915–926, doi:10.3762/bjnano.8.93

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  • ], plasma enhanced-chemical vapor deposition (PE-CVD) and radio frequency (RF) sputtering approach [12], and plasma enhanced-chemical vapor deposition and atomic layer deposition (ALD) followed by thermal treatment [13]. Among these preparation methods, impregnation is a commonly used approach for the
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Published 24 Apr 2017

Observing the morphology of single-layered embedded silicon nanocrystals by using temperature-stable TEM membranes

  • Sebastian Gutsch,
  • Daniel Hiller,
  • Jan Laube,
  • Margit Zacharias and
  • Christian Kübel

Beilstein J. Nanotechnol. 2015, 6, 964–970, doi:10.3762/bjnano.6.99

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  • -plane energy-filtered TEM (EFTEM) as was demonstrated for Si NCs formed by low energy Si ion implantation [10][26], plasma-enhanced chemical vapor deposition (PE-CVD) [27] or evaporation [28] followed by a high temperature annealing. The bottleneck in such measurements is the low TEM plane view specimen
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Published 15 Apr 2015
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